Abstract:Hemispherical resonator metallization is an important part in the manufacturing process of hemispherical resonator gyro, Aiming at the problem that the uniformity of hemispherical surface film preparation is difficult to achieve, a method combining film deposition experiment and optical simulation is proposed. In this paper, the Au film is deposited on the hemisphere by electron beam evaporation technique. The thickness of the film at different sites on the spherical surface is measured by Probe surface profiler, and the film thickness on the plane is equivalent to the film thickness on the hemispherical surface, so the uniformity of the spherical film is studied and the film thickness distribution of the film on the inner and outer surfaces of the hemisphere is obtained. At the same time, the uniformity of film deposition is optically simulated, and the irradiance on the hemispherical detector is equivalent to the film thickness obtained by the deposition in the experiment. The upper irradiance distribution calculated on hemispherical detector is in good agreement with the experimental measurements, which can provide a theoretical basis for the uniformity preparation of the hemispherical resonator nano-film. Keywords: Hemispherical resonator; electron beam evaporation; spherical surface; uniformity; optical simulation; nanofilm