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DOI:
飞控与探测:2019,2(2):54-58
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基于紫外纳米压印光刻的氟化混合物模板制备
(1.中国矿业大学信息与控制工程学院;2.电子信息与电气工程学院)
Fabrication of fluoridated hybrid replica mold by UV nanoimprinting lithography
(1.School of Information and Control Engineering,National Engineering Laboratory of Internet Application Technology in Mines,China University of Mining and Technology, Jinshan East Road,Quanshan District;2.National Key Laboratory of Micro/Nano Fabrication Technology,Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education,School of electronic information and electrical engineering,Shanghai Jiao Tong University, Dongchuan Road,Minhang District)
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投稿时间:2019-02-14    修订日期:2019-02-14
中文摘要: 不同特征尺度和不同周期的氟化混合物软复制模板通过使用硅主模板和紫外纳米压印光刻技术制备而成。与聚二甲基硅氧烷和其它聚合物材料比较,此处使用的光刻胶拥有优良的性能,比如优良的机械强度,低表面能和良好的热稳定性。在紫外和热纳米压印工艺中,主模板被用作印章。实验结果表明,转移到基底上的图案与主模板非常一致。所制备的氟化混合物复制模板不仅仅适合紫外纳米压印,也适用于热纳米压印,并且所加工的复制模板还被用于制备光电器件以实现传感、成像、探测、通信和数据存储等领域中的相关功能。
Abstract:The fluoridated hybrid soft replica molds with different feature sizes and periods are fabricated with silicon master templates by UV nanoimprinting lithography (NIL). Compared with PDMS and other polymer materials, the photoresist used here possesses excellent properties, such as good mechanism strength, low surface energy and thermal stability. The replica molds are used as stamps in UV and thermal nanoimprinting process. The experimental results show that the transferred patterns on the substrates are agreed well with the master molds. The fabricated fluoridated hybrid replica molds are not only suitable for UV nanoimprinting, but also for thermal nanoimprinting, and the fabricated replica molds can also be used as photonics-based devices for sensing, imaging, detection, telecommunication and data storage and so on.
文章编号:20190214001     中图分类号:TN389;TN23    文献标志码:
基金项目:中央高校基础研究基金(2014QNA81);中国科技部国际合作项目(2012DFA11070)
引用文本:
胡克想,王阳培华,王庆康.基于紫外纳米压印光刻的氟化混合物模板制备[J].飞控与探测,2019,2(2):54-58.

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